Fig. 1. Schematic diagram of chromium atomic lithography technique

Fig. 2. "Top-down" and "bottom-up" nano-length traceability chains

Fig. 3. The line width and grating are used to compare the contours and key parameters of the measured images when comparing the carriers, respectively

Fig. 4. Linewidth calibration method based on silicon crystal plane spacing. (a) Direct traceability method; (b) Comparative traceability method