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Acta Optica Sinica, Volume. 15, Issue 7, 913(1995)

The Teclmology Control and Properties of PECVD SiON Filmsand Its Potential Applications

[in Chinese]1, [in Chinese]2, [in Chinese]2, [in Chinese]3, [in Chinese]3, [in Chinese]3, and [in Chinese]4
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
  • 4[in Chinese]
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    [1] Xiao Heping, Sun Rujian, Ma Xiangzhu, Yang Kai, Zhang Shuangxiang. Characteristics of Compactness of SiO2 Thin Films Prepared by PECVD Method[J]. Laser & Optoelectronics Progress, 2016, 53(12): 123101

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. The Teclmology Control and Properties of PECVD SiON Filmsand Its Potential Applications[J]. Acta Optica Sinica, 1995, 15(7): 913

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    Paper Information

    Category: Thin Films

    Received: Jan. 19, 1994

    Accepted: --

    Published Online: Aug. 17, 2007

    The Author Email:

    DOI:

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology