Online re-optimization of optical filters on a production sputter tool

Stephan Waldner; Patrick Biedermann; Silvia Schwyn Thony

doi:10.3788/col201311.s10207

Chinese Optics Letters, Volume. 11, Issue s1, S10207(2013)

Online re-optimization of optical filters on a production sputter tool

Stephan Waldner, Patrick Biedermann, and Silvia Schwyn Thony

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References(6)

[1] [1] O. Zueger, in Proceedings of Vakuum V2011 Workshop 6: Beschichtung fur den optischen Geratebau Wsb 10 (2011).

[2] [2] B. T. Sullivan and J. A. Dobrowolski, Appl. Opt. 32, 2351 (1993).

[3] [3] M. Trubetskov, T. Amotchkina, and A. Tikhonravov, Proc. SPIE 8168, 81681D (2011).

[4] [4] A. V. Tikhonravov and M. K. Trubetskov, "OptiLayer thin film software", http://www.optilayer.com (2003).

[5] [5] T. V. Amotchkina, M. K. Trubetskov, V. Pervak, S. Schlichting, H. Ehlers, D. Ristau, and A. V. Tikhonravov, Appl. Opt. 50, 3389 (2011).

[6] [6] S. Schlichting, K. Heinrich, H. Ehlers, D. Ristau, Proc. SPIE 8168, 81681E (2011).

Cited By

[1] Stephan Waldner, Daniel Schachtler, Silvia Schwyn Thoeny, Thomas Frei. Efficient Development of Robust Strategies for Broadband and Monochromatic Optical Monitoring. Optical Interference Coatings Conference (OIC) 2022, WC.3(2022).

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Stephan Waldner, Patrick Biedermann, Silvia Schwyn Thony, "Online re-optimization of optical filters on a production sputter tool," Chin. Opt. Lett. 11, S10207 (2013)

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Paper Information

Category: Deposition and process control

Received: Dec. 20, 2012

Accepted: Jan. 20, 2013

Published Online: May. 30, 2013

The Author Email:

DOI:10.3788/col201311.s10207

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology