This contribution presents a magnetron sputter deposition tool with broadband optical monitor and online re-optimization capability for high volume production. The layer termination relies on a comparison of the actually measured reflection spectrum with a pre-calculated target spectrum. Spectra recorded after each deposited layer are analyzed by the re-optimization module and–in case of significant deviations–layer thicknesses and target spectra for the remaining layers are recalculated. This technique significantly improves the performance and reproducibility in case of highly demanding coating designs and is able to correct abnormal production errors in individual layers, which will lead to coating failure without reoptimization.