[1] [1] K. Kato, A. Kozen, Y. Muramoto, Y. Itaya, T. Nagatsuma, and M. Yaita, IEEE Photon. Technol. Lett. 6, 719 (1994).

[2] [2] J. Klamkin, A. Ramaswamy, L. A. Johansson, H. F. Chou, M. N. Sysak, J. W. Raring, N. Parthasarathy, S. P. Denbaars, J. E. Bowers, and L. A. Coldren, IEEE Photon. Technol. Lett. 19, 149 (2007).

[3] [3] S. M. Madison, J. Klamkin, D. C. Oakley, A. Napoleone, J. J. Plant, and P. W. Juodawlkis, IEEE Photon. J. 3, 676 (2011).

[4] [4] J. Klamkin, Y. C. Chang, A. Ramassamy, L. A. Johansson, J. E Bowers, S. P. DenBaars, and L. A. Coldren, IEEE J. Quantum Electron. 44, 354 (2008).

[5] [5] P. W. Juodawlkis, J. J. Plant, W. Loh, L. J. Missaggia, F. J. O’Donnell, D. C. Oakley, A. Napoleone, J. Klamkin, J. T. Gopinath, D. J. Ripin, S. Gee, P. J. Delfyett, and J. P. Donnelly, IEEE J. Sel. Top. Quantum Electron. 17, 1698 (2011).

[6] [6] P. G. Eliseev, G. A. Smolyakov, and M. Osinski, IEEE J. Sel. Top. Quantum Electron. 5, 771 (1999).

[7] [7] P. Gerard, Opt. Commun. 151, 110 (1998).

[8] [8] M. N. Draa, J. Bloch, D. Chen, D. C. Scott, N. Chen, S. B. Chen, X. Yu, W. S. Chang, and P. K. L. Yu, Opt. Express 18, 17729 (2010).

[9] [9] X. Yu, in Proceedings of the 5th SPIE International Symposium on Advanced Optical Manufacturing and Testing Technology 607 (2010).