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Acta Optica Sinica, Volume. 28, Issue 2, 337(2008)

Optimization of Topside Antireflective Coatings for Hyper Numerical Aperture Lithography

Zhou Yuan1,2、* and Li Yanqiu3
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    Zhou Yuan, Li Yanqiu. Optimization of Topside Antireflective Coatings for Hyper Numerical Aperture Lithography[J]. Acta Optica Sinica, 2008, 28(2): 337

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    Paper Information

    Category: Optical Design and Fabrication

    Received: May. 15, 2007

    Accepted: --

    Published Online: Mar. 24, 2008

    The Author Email: Yuan Zhou (zhouyuan@mail.iee.ac.cn)

    DOI:

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology