Chinese Journal of Lasers, Volume. 34, Issue 5, 723(2007)
Damage Threshold Improvement of Fused Silica Chip by CO2Laser Pretreatment
[1] [1] Raymaond M.Brusasco, Bernie M. Penetrante, John E. Peterson et al.. CO2-Laser Polishing for Reduction of 351-nm Surface Damage Initiation in Fused Silica [M]. Laser Induced Damage in Optical Material, 2001. 1~2
[2] [2] R. M Brusasco, B. M. Penetrante, J. A. Butler et al.. Localized CO2 Laser Treatment for Mitigation of 3ω Damage Growth on Fused Silica [C].Boulder Damage Symposium on Optical Material, 2001. 1~3
[4] [4] M. D. Feit, A. M. Rubenchik, C. D. Boley et al.. Development of a Progress Model for CO2 Laser Mitigation of Damage Growth in Fused Silica [C]. Annual Symposium on Optical Material for High Power Laser, 2002. 16~18
[5] [5] M. D. Feit, A. M. Rubenchik, C. D. Boley et al.. Development of a Prosess Molde for CO2 Laser Mitigation of Damage Growth in Fused Silica [C]. Annual Symposium on Optical Material for High Power Laser, 2003. 22~24
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Damage Threshold Improvement of Fused Silica Chip by CO2Laser Pretreatment[J]. Chinese Journal of Lasers, 2007, 34(5): 723