Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Acta Optica Sinica, Volume. 31, Issue 12, 1222007(2011)

Optimized Design of Silver Superlens for the Surface Plasmon Polaritons Interference Lithography Based on Backside-Exposure Technique

Xiao Xiao1、*, Zhang Zhiyou2, He Mingyang2, Xiao Zhigang1, and Xu Defu1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
    • show less
    AbstractGet PDF(in Chinese)
    Figures&Tables (0)
    Equations (0)
    References (15)
    Cited By (2)
    Tools
    Paper Information
    Topics
    Cited By

    Article index updated: Mar. 10, 2025

    The article is cited by 2 article(s) CLP online library. (Some content might be in Chinese.)
    Tools

    Get Citation

    Copy Citation Text

    Xiao Xiao, Zhang Zhiyou, He Mingyang, Xiao Zhigang, Xu Defu. Optimized Design of Silver Superlens for the Surface Plasmon Polaritons Interference Lithography Based on Backside-Exposure Technique[J]. Acta Optica Sinica, 2011, 31(12): 1222007

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Category: Optical Design and Fabrication

    Received: Jul. 1, 2011

    Accepted: --

    Published Online: Nov. 21, 2011

    The Author Email: Xiao Xiao (xiao_scu@sohu.com)

    DOI:10.3788/aos201131.1222007

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology