Study on the process of SiH<sub>4</sub>breakdown irradiated by frequency tunable TEA CO<sub>2</sub>laser

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Chinese Journal of Lasers, Volume. 19, Issue 8, 624(1992)

Study on the process of SiH₄breakdown irradiated by frequency tunable TEA CO₂laser

[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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The process of SiH4/Ar breakdown irradiated by frequency tunable TEA CO2 laser has been studied. The breakdown threshold of SiH4/Ar has been measured as a funotiou. of laser energy, laser frequency and gas pressure. Based on the experimental results, the physical process of 8iH4/Ar breakdown is proposed to be a process of optic-breakdown through resonant absorption of laser beams.

Keywords

breakdown CO2 laser SiH4 threshold

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on the process of SiH₄breakdown irradiated by frequency tunable TEA CO₂laser[J]. Chinese Journal of Lasers, 1992, 19(8): 624

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Paper Information

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Received: Jul. 9, 1990

Accepted: --

Published Online: Sep. 11, 2007

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Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology