Chinese Optics, Volume. 18, Issue 2, 224(2025)

Error modeling and analysis of dual-frequency laser interferometry in scanning beam interference lithography system

Xin-yu WANG1,2, Wen-hao LI1、*, Wei WANG1, Zhao-wu LIU1, Shan JIANG1、*, Wen-yuan ZHOU1,2, and [in Chinese]1
Author Affiliations
  • 1Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
  • 2University of Chinese Academy of Sciences, Beijing 101408, China
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    References(30)

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    [24] WU B Y, YU J L, WANG J. Accuracy correction of miniaturization device for air refractive index measurement[J]. Laser & Optoelectronics Progress, 55, 040102(2018).

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    [26] [26] SONG Y. Research on the interference fringe static dynamic phaselocking technology in the lithography system of the holographic grating[D]. Changchun: Graduate School of Chinese Academy of Sciences (Changchun Institute of Optics, Fine Mechanics Physics), 2014. (in Chinese).

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    Xin-yu WANG, Wen-hao LI, Wei WANG, Zhao-wu LIU, Shan JIANG, Wen-yuan ZHOU, [in Chinese]. Error modeling and analysis of dual-frequency laser interferometry in scanning beam interference lithography system[J]. Chinese Optics, 2025, 18(2): 224

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    Paper Information

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    Received: Aug. 28, 2024

    Accepted: Nov. 7, 2024

    Published Online: May. 19, 2025

    The Author Email:

    DOI:10.37188/CO.2024-0149

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