Process Method of Small-Tool Polishing for Mid-Spatial Frequency Error Smoothing of Conical Surface Component

Hang Fang; Yuchuan Chen; Lin Zhang; Ye Ding; Kailong Li; Kuo Hai; Yunfei Zhang

doi:10.3788/LOP242316

Laser & Optoelectronics Progress, Volume. 62, Issue 15, 1522001(2025)

Process Method of Small-Tool Polishing for Mid-Spatial Frequency Error Smoothing of Conical Surface Component

Hang Fang¹, Yuchuan Chen², Lin Zhang², Ye Ding¹, Kailong Li², Kuo Hai², and Yunfei Zhang^2、*

Author Affiliations

¹School of Mechanical Engineering, Shanghai Jiao Tong University, Shanghai 200204, China

²Sichuan Precision and Ultra-Precision Machining Engineering Technology Center, Chengdu 610200, Sichuan , China

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Figures & Tables(15)

Fig. 1. Schematic diagram of the smoothing principle of small tools for conical surface components

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Fig. 2. Finite element model of conical surface component and polishing pad

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Fig. 3. Contact pressure distributions calculated by finite element method in different locations. (a) L=10 mm; (b) L=15 mm; (c) L=25 mm; (d) L=35 mm

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Fig. 4. Schematic diagram of the local coordinate system

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Fig. 5. Calculated annular removal functions under different dwell locations. (a) L=10 mm; (b) L=15 mm; (c) L=25 mm; (d) L=35 mm

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Fig. 6. Flowchart of SQP algorithm^[15]

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Fig. 7. Calculated dwell time distribution

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Fig. 8. Flexible polishing pad

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Fig. 9. Comparisons between experimental and simulated removal functions. (a) L=20 mm; (b) L=25 mm; (c) L=30 mm

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Fig. 10. Surface profiles before and after uniform polishing. (a) Before uniform polishing; (b) after uniform polishing

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Fig. 11. PSD distributions of x and y directions before and after uniform polishing. (a) x direction; (b) y direction

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Fig. 12. Surface profiles of mid-spatial frequency before and after uniform polishing. (a) Before uniform polishing; (b) after uniform polishing

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Table 1. Material parameters of each layer for the polishing pad

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Table 1. Material parameters of each layer for the polishing pad

Layer	Material	Young’s modulus /（10¹¹ Pa）	Poisson’s ratio	Density /（kg·m^-3）	Material constant C10 /（10⁵ Pa）	Material constant C01 /（10⁵ Pa）	Incompressibility parameter D1 /Pa^-1
Rigid layer	Brass	1.142	0.345	8712	—	—	—
Compliant layer	Rubber	—	—	949.8	1.6	0.41	0.0010
Contact layer	Polyurethane	—	—	432.5	9.236	2.309	0.0012

Table 2. Parameters of spot sampling
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Table 2. Parameters of spot sampling
Parameter Value
Location $L$ /mm 20， 25， 30
Polishing power $F$ /N 22
Angular velocity of polishing pad $ω_{p a d}$ /（r·min^-1） 50
Rotating ratio $n$ -0.5
Dwell time /min 5
Polishing slurry 10% cerium oxide

Table 3. Parameters of uniform polishing
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Table 3. Parameters of uniform polishing
Parameter Value
Polishing power $F$ /N 22
Angular velocity of polishing pad $ω_{p a d}$ /（r·min^-1） 200
Rotating ratio $n$ -0.5
Dwell time /min 60
Polishing slurry 10% cerium oxide

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Hang Fang, Yuchuan Chen, Lin Zhang, Ye Ding, Kailong Li, Kuo Hai, Yunfei Zhang. Process Method of Small-Tool Polishing for Mid-Spatial Frequency Error Smoothing of Conical Surface Component[J]. Laser & Optoelectronics Progress, 2025, 62(15): 1522001

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