Chinese Journal of Lasers, Volume. 43, Issue 6, 603001(2016)

Effect of Substrate′s Crystalline Structure on Crystalline and Mechanical Properties of HfO2 Thin Films

Guo Jialu1,2、*, Liu Xiaofeng1, Zhao Yuanan1, Shao Jianda1, Zhao Jiaoling1,2, Huang Haopeng1,2, and Cui Yanyan1,2
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  • 2[in Chinese]
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    CLP Journals

    [1] Fu Xiuhua, Fan Jiachen, Zhang Jing, Xiong Shifu, Chen Zhihang, Yang Yongliang. Development of Heat Radiation Filter Film for Ultraviolet Curing System[J]. Chinese Journal of Lasers, 2017, 44(3): 303002

    [2] Hao Shuai, Cui Bifeng, Fang Tianxiao, Wang Yang. Effects of Substrate Temperature and Ion Source Energy on Stress of Thin Film[J]. Laser & Optoelectronics Progress, 2018, 55(9): 93101

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    Guo Jialu, Liu Xiaofeng, Zhao Yuanan, Shao Jianda, Zhao Jiaoling, Huang Haopeng, Cui Yanyan. Effect of Substrate′s Crystalline Structure on Crystalline and Mechanical Properties of HfO2 Thin Films[J]. Chinese Journal of Lasers, 2016, 43(6): 603001

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    Paper Information

    Category: materials and thin films

    Received: Feb. 1, 2016

    Accepted: --

    Published Online: Jun. 6, 2016

    The Author Email: Jialu Guo (guojialu@siom.ac.cn)

    DOI:10.3788/cjl201643.0603001

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