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Acta Optica Sinica, Volume. 32, Issue 6, 631001(2012)

Technique to Minimize the Characterization Deviations of Optical Parameters of Thin Films Caused by Ellipsometric Measurement Systematic Errors

Wu Suyong*, Long Xingwu, and Yang Kaiyong
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    Article index updated: Mar. 10, 2025

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    Wu Suyong, Long Xingwu, Yang Kaiyong. Technique to Minimize the Characterization Deviations of Optical Parameters of Thin Films Caused by Ellipsometric Measurement Systematic Errors[J]. Acta Optica Sinica, 2012, 32(6): 631001

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    Paper Information

    Category: Thin Films

    Received: Nov. 11, 2011

    Accepted: --

    Published Online: May. 16, 2012

    The Author Email: Suyong Wu (sywu2001@163.com)

    DOI:10.3788/aos201232.0631001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology