The article is based on the Two Photon Polymerization (TPP) effect,namely the Two Photon Lithography (TPL) 3D printing technology,which achieves the fabrication of ultra diffraction limits and highly complex structures.It also achieves the processing of large aspect ratio nanopillars and metasurfaces composed of these nanopillars.The effects of different TPP process parameters on the nanopillars size of IP-Dip photoresist are studied,and the parameters are optimized.The innovation of this paper is in the following two points:(1)Analyzed the size changes of nanopillars under different laser parameters,and identified the threshold parameter corresponding to the minimum linewidth to prepare nanopillars with high aspect ratios.(2)For the optimization of fabrication steps,steps such as UV curing and supercritical carbon dioxide drying were added after the development step,are used to ensure that the nanopillars does not collapse and has good stability.The rectangular nanopillars with a maximum aspect ratio of nearly 15∶1 and a minimum line width of 214.80nm are prepared stably,and the circular nanopillars with a maximum aspect ratio of nearly 20∶1 and a minimum diameter of 145.44nm are prepared stably,and the prepared large aspect ratio nanopillars are applied in the fabrication of metasurfaces.