Ultrafast reflection and secondary ablation in laser processing of transparent dielectrics with ultrashort pulses

Mingying Sun; Urs Eppelt; Wolfgang Schulz; Jianqiang Zhua

doi:10.1117/1.oe.53.5.051512

Collection Of theses on high power laser and plasma physics, Volume. 12, Issue 1, 51512(2014)

Ultrafast reflection and secondary ablation in laser processing of transparent dielectrics with ultrashort pulses

Mingying Sun^1,2,3, Urs Eppelt^2,3, Wolfgang Schulz^2,3, and Jianqiang Zhua¹

¹Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, No. 390, Qinghe Road, Jiading District, Shanghai 201800, China

²Fraunhofer Institute for Laser Technology, Steinbachstrae 15, 52074 Aachen, Germany

³RWTH Aachen University, Nonlinear Dynamics of Laser Processing, Steinbachstrae 15, 52074 Aachen, Germany

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Mingying Sun, Urs Eppelt, Wolfgang Schulz, Jianqiang Zhua. Ultrafast reflection and secondary ablation in laser processing of transparent dielectrics with ultrashort pulses[J]. Collection Of theses on high power laser and plasma physics, 2014, 12(1): 51512

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Received: Aug. 1, 2013

Accepted: --

Published Online: Jun. 2, 2017

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DOI:10.1117/1.oe.53.5.051512

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology