The electron beam lithography system plays an indispensable role in teaching and research of semiconductor physics and devices in universities. Building an electron beam lithography system based on the existing scanning electron microscope of the university has lower cost and multiple applications. By building a complete training system, including theoretical knowledge training, classification practical training, and supplementary training on difficult points, the efficiency and effectiveness of the use of instrument have been improved. Instrument users and managers work together to maintain and conserve the instrument, extending its service life.