Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Acta Optica Sinica, Volume. 35, Issue 6, 622005(2015)

Simulation Model Based on Equivalent Layer Method for Defective Mask Multilayer in Extremeultra violet Lithography

Liu Xiaolei1,2、*, Li Sikun1,2, and Wang Xiangzhao1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
    • show less
    AbstractGet PDF(in Chinese)
    Figures&Tables (0)
    Equations (0)
    References (23)
    Cited By (6)
    Tools
    Paper Information
    Topics
    Cited By

    Article index updated: Mar. 10, 2025

    The article is cited by 6 article(s) CLP online library. (Some content might be in Chinese.)
    Tools

    Get Citation

    Copy Citation Text

    Liu Xiaolei, Li Sikun, Wang Xiangzhao. Simulation Model Based on Equivalent Layer Method for Defective Mask Multilayer in Extremeultra violet Lithography[J]. Acta Optica Sinica, 2015, 35(6): 622005

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Category: Optical Design and Fabrication

    Received: Dec. 31, 2014

    Accepted: --

    Published Online: May. 20, 2015

    The Author Email: Xiaolei Liu (liuxl@siom.ac.cn)

    DOI:10.3788/aos201535.0622005

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology