Numerical Study on Hydride Vapor-Phase Epitaxy Chamber with Showerhead for Gallium Oxide Growth using Orthogonal Experiments

WU Shiying; CHEN Lin; JIANG Shaoqing; GUO Fangzheng; TAO Zhikuo

doi:10.16818/j.issn1001-5868.2024052603

Semiconductor Optoelectronics, Volume. 45, Issue 6, 910(2024)

Numerical Study on Hydride Vapor-Phase Epitaxy Chamber with Showerhead for Gallium Oxide Growth using Orthogonal Experiments

WU Shiying, CHEN Lin, JIANG Shaoqing, GUO Fangzheng, and TAO Zhikuo

Author Affiliations

College of Electronic and Optical Engineering, College of Flexible Electronics, Nanjing University of Posts and Telecommunications, Nanjing 210023, CHN

show less

Abstract Get PDF(in Chinese)

Figures & Tables(0)

Tools

Get Citation

Copy Citation Text

WU Shiying, CHEN Lin, JIANG Shaoqing, GUO Fangzheng, TAO Zhikuo. Numerical Study on Hydride Vapor-Phase Epitaxy Chamber with Showerhead for Gallium Oxide Growth using Orthogonal Experiments[J]. Semiconductor Optoelectronics, 2024, 45(6): 910

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category:

Received: May. 26, 2024

Accepted: Feb. 28, 2025

Published Online: Feb. 28, 2025

The Author Email:

DOI:10.16818/j.issn1001-5868.2024052603

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology