[1] [1] Ronfu Chu, Chungwei Hsu, Tsu-Wen Hwang. Characterizing lens distortion to overlay accuracy by using fine measurement pattern[C]. Proc. SPIE, 1999, 3677: 83～94

[3] [3] M. A. van den Brink, C. G. M. de Mol, R. A. George. Matching performance for multiple wafer steppers using an advanced metrology procedure[C]. Proc. SPIE, 1988, 921: 180～197

[4] [4] Jieh-Jang Chen, Chen-Ming Huang, Fan-Jia Shiu et al.. Influence of coma effect on scanner overlay[C]. Proc. SPIE, 2002, 4689: 280～285

[5] [5] Hiroshi Nomura, Takashi Sato. Overlay error due to coma and asymmetric illumination dependence on pattern feature[C]. Proc. SPIE, 1999, 3332: 83～94

[7] [7] Hans van der Laan, Marcel Hans Dierichs, Henk van Greevenbroek et al.. Aerial image measurement methods for fast aberration set-up and illumination pupil verification[C]. Proc. SPIE, 2001, 4346: 394～407

[8] [8] Fan Wang, Xiangzhao Wang, Mingying Ma et al.. Coma measurement by transmission image sensor with PSM[C]. Proc. SPIE, 2004, 5645: 208～216

[10] [10] Paul Greupner, Reiner Garreis, Aksel Ghnermeier et al.. Impact of wavefront errors on low k1 processes at extreme high NA[C]. Proc. SPIE, 2003, 5040: 119～130

[11] [11] Christian Wagner, Winfried Kaiser, Jan Mulkens et al.. Advanced technology for extending optical lithography[C]. Proc. SPIE, 2000, 4000: 344～357

[12] [12] Takashi Sato, Hiroshi Nomura. Coma aberration measurement by relative shift of displacement with pattern dependence[J]. Jpn. J. Appl. Phys., 1998, 37: 3553～3557

[13] [13] M. Born, E. Wolf. Principles of Optics[M]. 7th ed.. Cambridge: Cambridge University Press, 1999. 517～543