Chinese Journal of Lasers, Volume. 36, Issue s2, 215(2009)

Null Ellipsometry Based on Photoelastic Modulation

Yang Kun1、* and Wang Xiangzhao2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    References(10)

    [1] [1] Hiroshi Takasako. Automatic ellipsometer. automatic polarimetry by means of an ADP polarization modulator Ⅲ[J]. Appl. Opt.,1966,5(5):759-764

    [2] [2] J. L. Ord,B. L. Wills. A computer-operated following ellipsometry[J]. Appl. Opt.,1967,6(10):1673-1677

    [3] [3] H. J. Mathieu,D. E. McClure,R. H. Muller. Fast self-compensating ellipsometer[J]. Rev. Sci. Instrum.,1974,45(6):798-802

    [4] [4] M. Yamamoto,Y. Hotta,M. Sato. A tracking ellipsometer of picometer sensitivity enabling 0.1% sputtering-rate monitoring of EUV nanometer multilayer fabrication[J]. Thin. Solid. Film,2003,433:224-229

    [5] [5] H. Zhu,L. Liu,Y. Wen et al.. High-precision system for automatic null ellipsometric measurement[J]. Appl. Opt.,2002,41(22):4536-4540

    [6] [6] K. Postava,A. Maziewski,T. Yamaguchi et al.. Null ellipsometer with phase modulation[J]. Opt. Express,2004,12(24):6040-6045

    [7] [7] Harland G. Tompkins,Eugene A. Irene. Handbook of Ellipsometry[M]. New York:William Andrew,Inc.,2005. 12

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    Yang Kun, Wang Xiangzhao. Null Ellipsometry Based on Photoelastic Modulation[J]. Chinese Journal of Lasers, 2009, 36(s2): 215

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    Paper Information

    Category: Measurement and metrology

    Received: --

    Accepted: --

    Published Online: Dec. 30, 2009

    The Author Email: Yang Kun (yyyk2002@163.com)

    DOI:10.3788/cjl200936s2.0215

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