High ion current density plasma source for ion-assisted deposition of optical thin films

Chinese Optics Letters, Volume. 8, Issue s1, 49(2010)

Frank Placido¹ and Des Gibson²

Author Affiliations

¹Thin Film Centre, University of the West of Scotland Paisley, Paisley, PA1 2BE, Scotland

²Thin Film Solutions Ltd., Block 7, West of Scotland Science Park, Glasgow G20 0TH, Scotland

show less

References(9)

[1] [1] P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, and W. G. Sainty, Appl. Opt. 22, 178 (1983).

[2] [2] M. L. Fulton, Proc. SPIE 2253, 374 (1994).

[3] [3] B. G. Bovard, Thin Films for Optical Systems F. R. Flory, (ed.) (Marcel Dekker, New York, 1994).

[4] [4] H. R. Kaufman, R. S. Robinson, and R. I. Seddon, J. Vac. Sci. Technol. A5 (4), 2081 (1987).

[5] [5] A. Zoller, S. Beisswenger, R. Golzelmann and K. Matl, Proc. SPIE 2253, 394 (1994).

[6] [6] D. R. Gibson, D. Yates, J. O’Driscoll, and J. Allen, in Proceedings of SVC Conference. (2002).

[7] [7] J. D. Targrove, L. J. Lingg, and H. A Macleod, Optical Interference Coatings (Washington Optical Society of America, Tucsen, 1988), p268.

[8] [8] D. R. Gibson, in Proceedings of SVC Conference(2002).

[9] [9] D. R. Gibson, Patent No. EP 1154459 A2.

Cited By

Tools

Get Citation

Copy Citation Text

Frank Placido, Des Gibson, "High ion current density plasma source for ion-assisted deposition of optical thin films," Chin. Opt. Lett. 8, 49 (2010)

Download Citation

Paper Information

Received: Nov. 25, 2009

Accepted: --

Published Online: May. 14, 2010

The Author Email:

Topics