[1] [1] Sommargren G E, Phillion S W, Johnson Michael A, et al. 100-Picometer interferometry for EUVL [J]. Proceeding of SPIE(S0277-786X), 2002, 4688: 316-328.

[2] [2] Sugisaki Katsumi, Zhu Yucong, Yoshio Gomei, et al. Present Status of the ASET At-wavelength Phase-shifting Point Diffraction Interferometer [J]. Proceeding of SPIE(S0277-786X), 2000, 4146: 47-53.

[3] [3] Daniel Malacara. Optical Shop Testing: 3rd ed [ M]. Hoboken: John Wiley & Sons, Inc, 2007: 19-54.

[4] [4] Sang Hun Lee, Patrick Naullear, Kenneth A Goldberg, et al. Phase shifting point diffract ion interferometry at 193 nm [J]. Applied Optics(S0003-6935), 2000, 39(31): 5768-5772.

[5] [5] Naulleau Patrick, Goldberg Kenneth A. Dual-domain Point Diffraction Interferometer [J]. Applied Optics(S0003-6935), 1999, 38(16): 3523-3532.

[10] [10] Otaki K, Zhua Y, Ishij M, et al. Rigorous wavefront analysis of the visible light point diffraction interferometer for EUVL [J]. Proceeding of SPIE (S0277-786X), 2004, 5193: 182-190.

[11] [11] Goldberg K A, Tejnil E, Bokor J. A 3D numerical study of pinhole diffraction to predict the accuracy of EUV point diffraction interferometry [C]// Extreme Ultraviolet Lithography, Optical Society of America, Boston, US, April 29~May 3, 1996: 133-137.