Acta Optica Sinica, Volume. 39, Issue 12, 1231001(2019)

Uniformity of Film Thickness Distribution for Single Evaporation Source

Xiuhua Fu1, Di Zhao1、*, Cheng Lu2, Guojun Ma1, and Ganghua Bao2
Author Affiliations
  • 1School of Optoelectronic Engineering, Changchun University of Science and Technology, Changchun, Jilin 130022, China
  • 2Chengdu Guotai Vacuum Equipment Co., Ltd., Chengdu, Sichuan 611130, China
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    Figures & Tables(8)
    Geometric diagram of calculation of non-cosine film thickness
    Polar coordinate diagram of instantaneous film thickness distribution
    Instantaneous film thickness distribution at different locations on deposition surface
    Computational width of corrected mask when evaporating single film
    Computational widths of two corrected masks
    Reflectivity of two films. (a) H4 monolayer film; (b) MgF2 monolayer film
    Thickness distributions of two films. (a) H4 monolayer film; (b) MgF2 monolayer film
    • Table 1. Evaporation process parameters of H4 monolayer film and MgF2 monolayer film

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      Table 1. Evaporation process parameters of H4 monolayer film and MgF2 monolayer film

      MaterialDegree of vacuum /PaSubstrate temperature /℃Evaporation rate /(nm·s-1)
      H410-22800.3
      MgF22800.6
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    Xiuhua Fu, Di Zhao, Cheng Lu, Guojun Ma, Ganghua Bao. Uniformity of Film Thickness Distribution for Single Evaporation Source[J]. Acta Optica Sinica, 2019, 39(12): 1231001

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    Paper Information

    Category: Thin Films

    Received: Jul. 1, 2019

    Accepted: Aug. 14, 2019

    Published Online: Dec. 6, 2019

    The Author Email: Di Zhao (zhaodi9425@163.com)

    DOI:10.3788/AOS201939.1231001

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