Opto-Electronic Science, Volume. 1, Issue 10, 220016(2022)
Large-scale and high-quality III-nitride membranes through microcavity-assisted crack propagation by engineering tensile-stressed Ni layers
Jung-Hong Min1, Kwangjae Lee2, Tae-Hoon Chung3, Jung-Wook Min1, Kuang-Hui Li1, Chun Hong Kang1, Hoe-Min Kwak4, Tae-Hyeon Kim5, Youyou Yuan6, Kyoung-Kook Kim5, Dong-Seon Lee4, Tien Khee Ng1, and Boon S. Ooi1、*
Author Affiliations
1Photonics Laboratory, Computer, Electrical and Mathematical Sciences and Engineering Division (CEMSE), King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Saudi Arabia2Department of Electrical Engineering, Stanford University, Stanford, CA 94305, USA3Light Source Research Division, Korea Photonics Technology Institute (KOPTI), Gwangju 61007, Republic of Korea4School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea5Department of Advanced Convergence Technology, Research Institute of Advanced Convergence Technology, Korea Polytechnic University, 237 Sangidaehak-ro, Siheung-si 15073, Republic of Korea6King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Saudi Arabiashow less
Tools
Get Citation
Copy Citation Text
Jung-Hong Min, Kwangjae Lee, Tae-Hoon Chung, Jung-Wook Min, Kuang-Hui Li, Chun Hong Kang, Hoe-Min Kwak, Tae-Hyeon Kim, Youyou Yuan, Kyoung-Kook Kim, Dong-Seon Lee, Tien Khee Ng, Boon S. Ooi. Large-scale and high-quality III-nitride membranes through microcavity-assisted crack propagation by engineering tensile-stressed Ni layers[J]. Opto-Electronic Science, 2022, 1(10): 220016
Share