Acta Optica Sinica, Volume. 5, Issue 2, 157(1985)
In-situ measurement of inhomogeneity for optical thin films by ellipsometry
References(0)
Tools
Get Citation
Copy Citation Text
WU QIHOUG. In-situ measurement of inhomogeneity for optical thin films by ellipsometry[J]. Acta Optica Sinica, 1985, 5(2): 157
Paper Information
Category: Thin Films
Received: Mar. 2, 1984
Accepted: --
Published Online: Sep. 16, 2011
The Author Email:
CSTR:32186.14.
© Copyright 2018-2021 | Chinese Laser Press.
All Rights Reserved 沪ICP备15018463号-20