Fig. 1. Thickness profile of the TFLN.

Fig. 2. Schematic of the membrane-based 1DPhC fabrication process: (a) bonding of bulk LiNbO3 to Si with Cr and Au, (b) LiNbO3 polishing, (c) photoresist deposition, (d) UV lithography of the photoresist, (e) DRIE etching of Si and wet etching of Cr and Au, (f) photoresist removal, and (g) multilayer deposition.

Fig. 3. (a) Microscope images of the membranes. (b) Microscope images of the membranes after multilayer deposition.

Fig. 4. (a) FIB-SEM image of the membrane. (b) FIB-SEM image of the 1DPhC (suspended membrane).

Fig. 5. Schematic of the on-glass 1DPhC fabrication process: (a) obtaining TFLN with smart cut technology, (b) multilayer deposition, (c) UV glue bonding to the glass substrate, (d) protection of the sample with photoresist, (e) DRIE etching of Si and RIE etching of SiO2, and (f) photoresist removal.

Fig. 6. (a) Dispersion curves for the on-membrane 1DPhC. (b) Dispersion curves for the on-glass 1DPhC.

Fig. 7. (a) Experimental setup for the on-membrane 1DPhC. (b) Experimental setup for the on-glass 1DPhC.

Fig. 8. (a) Camera image intensity profile of the BWS-related reflectance dip for the membrane-based sample. (b) Camera image intensity profile of the BWS-related reflectance dip for the on-glass sample.