Chinese Journal of Lasers, Volume. 51, Issue 12, 1202415(2024)

Image Accuracy Optimization Method for Maskless Lithography Based on DMD (Invited)

Hua Liu*, Long Huang, and Yuqing Liu
Author Affiliations
  • Center for Advanced Optoelectronic Functional Materials Research, Key Laboratory for UV-Emitting Materials and Technology of Ministry of Education, National Demonstration Center for Experimental Physics Education, School of Physics of Northeast Normal University, Changchun 130024, Jilin , China
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    References(32)

    [4] Zhang P, Qiao Y Q, Su X H et al. Drilling straight-walled holes in glass fiber-reinforced composites by double galvanometer laser scanning[J]. Chinese Journal of Lasers, 50, 2402403(2023).

    [6] Zhang Z J, Fang Y, Wang Q S et al. High-order bessel beam generator with high laser-induced damage threshold fabricated by femtosecond laser[J]. Acta Optica Sinica, 43, 1326003(2023).

    [16] Wang K K, Wang C, Shi H D et al. Polarization aberration analysis and compensation of off-axis optical system with digital micro-mirror device[J]. Acta Optica Sinica, 42, 1611001(2022).

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    Hua Liu, Long Huang, Yuqing Liu. Image Accuracy Optimization Method for Maskless Lithography Based on DMD (Invited)[J]. Chinese Journal of Lasers, 2024, 51(12): 1202415

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    Paper Information

    Category: Laser Micro-Nano Manufacturing

    Received: Mar. 4, 2024

    Accepted: Apr. 16, 2024

    Published Online: Jun. 4, 2024

    The Author Email: Liu Hua (liuh146@nenu.edu.cn)

    DOI:10.3788/CJL240651

    CSTR:32183.14.CJL240651

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