Chinese Journal of Lasers, Volume. 51, Issue 12, 1202415(2024)
Image Accuracy Optimization Method for Maskless Lithography Based on DMD (Invited)
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Hua Liu, Long Huang, Yuqing Liu. Image Accuracy Optimization Method for Maskless Lithography Based on DMD (Invited)[J]. Chinese Journal of Lasers, 2024, 51(12): 1202415
Category: Laser Micro-Nano Manufacturing
Received: Mar. 4, 2024
Accepted: Apr. 16, 2024
Published Online: Jun. 4, 2024
The Author Email: Liu Hua (liuh146@nenu.edu.cn)
CSTR:32183.14.CJL240651