[1] [1] S. Owa, H. Nagasaka. Advantage and feasibility of immersion lithography［J］. J. Microlith. Microfab. Microsyst., 2004, 3(1): 97～103

[2] [2] K. Adam, W. Maurer. Polarization effects in immersion lithography［J］. J. Microlith., Microfab., Microsyst., 2005, 4(3): 031106

[3] [3] B. W. Smith, J. S. Cashmore. Challenges in high NA, polarization, and photoresists［C］. SPIE, 2002, 4691: 11～24

[4] [4] Zhang Wei, Gong Yan. Vector analysis of diffractive optical elements for off-axis illumination of projection lithographic system［J］. Acta Optica Sinica, 2011, 31(10): 1005002

[5] [5] Yuan Qiongyan, Wang Xiangzhao. Recent development of international mainstream lithographic tools［J］. Laser & Optoelectronics Progress, 2007, 44(1): 57～64

[6] [6] D. G. Flagello. Challenges with hyper-NA (NA>1.0) polarized light for sub 1/4 resolution［C］. SPIE, 2005, 5754: 53～68

[7] [7] T. Matsuyama, T. Nakashima. Study on high NA imaging with polarized illumination［C］. SPIE, 2005, 5754: 1078～1089

[8] [8] H. Nishinaga, N. Tokuda, S. Owa et al.. Development of a polarized-light illuminator and its impact［C］. SPIE, 2005, 5754: 669～680

[9] [9] Q. Y. Yuan, X. Z. Wang, Z. C. Qiu. Impact of polarized illumination on high NA imaging in ArF immersion lithography at 45 nm node［J］. Optik, 2007, 120: 325～329

[10] [10] Song Zhiping, Hong Jin, Qiao Yanli. Method acquiring the demodulation coefficients of intensity-modulated spectropolarimeter by measuring reference light［J］. Acta Optica Sinica, 2012, 32(4): 0412003

[11] [11] D. Goldstein. Polarized Light［M］. New York: Marcel Dekker, 2003

[12] [12] Liao Yanbiao. Polarization Optics［M］. Beijing: Science Press, 2003

[13] [13] R. M. A. Azzam, N. M. Bashara. Ellipsometry and Polarized Light［M］. Liang Jimin, Yi Shubai, Zhang Fuchu et al. Transl.. Beijing: Science Press, 1986

[14] [14] T. Fujii, N. Kita, Y. Mizuno. On board polarization measuring instrument for high NA excimer scanner［C］. SPIE, 2005, 5752: 846～852

[15] [15] P. S. Hauge. Mueller matrix ellipsometry with imperfect compensators［J］. J. Opt. Soc. Am., 1978, 68(11): 1519～1528

[16] [16] D. H. Goldstein, R. A. Chipman. Error analysis of a Mueller matrix polarimeter［J］. J. Opt. Soc. Am. A, 1990, 7(4): 693～700

[17] [17] H. R. Jerrard. The calibration of quarter-wave plates［J］. J. Opt. Soc. Am., 1952, 42(3): 159～165