Advanced Photonics, Volume. 1, Issue 5, 056003(2019)
Resolution limit of label-free far-field microscopy
Fig. 1. The schematic representation of the imaging set-up, for the object formed by (a) an array of small particles/lines and (b) a (binary) mask.
Fig. 2. Super-resolution object reconstruction for a binary mask, from its coherently detected diffraction pattern in the far field. The inset shows the schematics of the object profile. The main panel plots the error probability in the recovered profile, as a function of the effective SNR. The data shown were obtained for 10,000 different realizations. The boundary separating the light-red and light-green background corresponds to the value of the SNR corresponding to
Fig. 3. Super-resolution imaging of a subwavelength object, based on structured illumination with Bessel beams. (a) The “incident” Bessel beam of the order
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Evgenii Narimanov, "Resolution limit of label-free far-field microscopy," Adv. Photon. 1, 056003 (2019)
Category: Research Articles
Received: Sep. 17, 2019
Accepted: Oct. 15, 2019
Published Online: Nov. 2, 2019
The Author Email: Narimanov Evgenii (evgenii@purdue.edu)