[1] Matsuyama T, Ohmura Y, Fujishima Y et al. Catadioptric projection lens for 1.3 NA scanner[J]. Proceedings of SPIE, 6520, 652021(2007). http://spie.org/Publications/Proceedings/Paper/10.1117/12.711340

[2] Chipman R A, Chipman L J. Polarization aberration diagrams[J]. Optical Engineering, 28, 282100(1989).

[3] McGuire J P, Chipman R A. Polarization aberrations: 1 rotationally symmetric optical systems[J]. Applied Optics, 33, 5080-5100(1994). http://www.opticsinfobase.org/abstract.cfm?uri=ao-33-22-5080

[4] Mcintyre G R, Kye J, Levinson H et al. Polarization aberrations in hyper-numerical-aperture projection printing: a comparison of various representations[J]. Nanolithography, MEMS, and MOEMS, 5, 033001(2006). http://spie.org/Publications/Journal/10.1117/1.2358129

[5] Totzeck M, Graupner P, Heil T et al. How to describe polarization influence on imaging[J]. Proceedings of SPIE, 5754, 23-37(2005).

[6] van der Laan H, Dierichs M, van Greevenbroek H et al. . Aerial image measurement methods for fast aberration set-up and illumination pupil verification[J]. Proceedings of SPIE, 4346, 394-407(2001). http://www.sciencedirect.com/science/article/pii/S0043135400004504

[7] Hagiwara T, Kondo N, Hiroshi I et al. Development of aerial image based aberration measurement technique[J]. Proceedings of SPIE, 5754, 1659-1669(2004). http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=861834

[8] Duan L F, Wang X Z, Bourov A Y et al. In situ aberration measurement technique based on principal component analysis of aerial image[J]. Optics Express, 19, 18080-18090(2011). http://www.opticsinfobase.org/abstract.cfm?uri=oe-19-19-18080

[9] Dong L S, Li Y Q, Dai X B et al. Measuring the polarization aberration of hyper-NA lens from the vector aerial image[J]. Proceedings of SPIE, 9283, 928313(2014). http://spie.org/x648.xml?product_id=2069702

[10] Shen L N, Wang X Z, Li S K et al. Measuring method of polarization aberration based on vector aerial image of alternating phase-shift mask[J]. Acta Optica Sinica, 36, 0811003(2016).

[11] Xiang Z B, Li Y Q. Retrieve polarization aberration from image degradation: a new measurement method in DUV lithography[J]. Proceedings of SPIE, 10460, 104601W(2017).

[12] Totzeck M. Orientation Zernike polynomials: a useful way to describe the polarization effects of optical imaging systems[J]. Nanolithography, MEMS, and MOEMS, 8, 031404(2009). http://spie.org/Publications/Journal/10.1117/1.3173803

[13] Kye J. McIntyre G, Norihiro Y, et al. Polarization aberration analysis in optical lithography systems[J]. Proceedings of SPIE, 6154, 61540E(2006).

[14] Erdmann A, Shao F, Agudelo V et al. Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography[J]. Journal of Modern Optics, 58, 480-495(2011). http://www.tandfonline.com/doi/full/10.1080/09500340.2010.515752

[15] Graaf R D, Weichselbaum S, Droste R et al. NXT: 1980Di immersion scanner for 7 nm and 5 nm production nodes[J]. Proceedings of SPIE, 9780, 978011(2016). http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2504923

[16] Wong A K. Optical imaging in rojection micro lithography[M]. Bellingham, Washington: SPIE, 155-157(2005).

[17] Xue J, Moen K, Spanos C J. Integrated aerial image sensor: design, modeling, and assembly[J]. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 24, 3088-3093(2006). http://scitation.aip.org/content/avs/journal/jvstb/24/6/10.1116/1.2393296

[18] Unno Y. Modeling of a slit-scan-type aerial image measurement sensor used for optical lithography[J]. Applied Optics, 50, 271-281(2011). http://www.ncbi.nlm.nih.gov/pubmed/21263721