[1] [1] M. Losurdo, M. Bergmair, G. Bruno et al.. Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives [J]. Nanopart. Res., 2009, 11(7): 1521～1554

[2] [2] M. Losurdo, M. M. Giangregorio, P. Capezzuto et al.. Structural and optical properties of nanocrystalline Er2O3 thin films deposited by a versatile low-pressure MOCVD approach [J]. Electrochem. Soc., 2008, 155(2): G44～G50

[3] [3] S. B. Hatit, M. Foldyna, A. De Martino et al.. Angle-resolved Mueller polarimeter using a microscope objective [J]. Phys. Stat. Sol. A, 2008, 205(4): 743～747

[4] [4] G. R. McIntyre, J. Kye, H. Levinson et al.. Polarization aberrations in hyper-numerical-aperture projection printing: a comparison of various representations [J]. J. Micro Nanolith., MEMS, MOEMS, 2006, 5(3): 033001

[5] [5] R. A. Chipman. Handbook of Optics [M]. New York: McGraw Hill, Inc.,1995

[6] [6] D. Goldstein. Polarized Light [M]. New York: Marcel Dekker, Inc., 2003

[7] [7] S. Breugnot, P. Clemenceau. Modeling and performances of a polarization active imager at λ=806 nm [J]. Opt. Eng., 2000, 39(10): 2681～2688

[8] [8] I. J. Vaughn, B. G. Hoover. Noise reduction in a laser polarimeter based on discrete wave plate rotations [J]. Opt. Express, 2008, 16(3): 2091～2108

[9] [9] Y. Takakura, J. E. Ahmad. Noise distribution of Mueller matrices retrieved with active rotating polarimeters [J]. Appl. Opt., 2007, 46(30): 7354～7364

[10] [10] J. Zallat, S. Ainouz, M. P. Stoll. Optimal configurations for imaging polarimeters: impact of image noise and systematic errors [J]. J. Opt. A: Pure Appl. Opt., 2006, 8(9): 807～814

[11] [11] A. Ambirajan, D. C. Look Jr. Optimum angles for a polarimeter: part II [J]. Opt. Eng., 1995, 34(6): 1656～1658

[12] [12] A. Zeng, F. Li, L. Zhu et al.. Simultaneous measurement of retardance and fast axis angle of a quarter-wave plate using one photoelastic modulator [J]. Appl. Opt., 2011, 50(22): 4347～4352

[13] [13] W. Guan, P. J. Cook, G. A. Jones et al.. Experimental determination of the Stokes parametersusing a dual photoelastic modulator system [J]. Appl. Opt., 2010, 49(14): 2644～2652

[14] [14] W. Guan, G. A. Jones, Y. W. Liu et al.. The measurement of the Stokes parameters: a generalized methodology using a dual photoelastic modulator system [J]. Appl. Phys., 2008, 103(4): 043104

[15] [15] Y. W. Liu, G. A. Jones, Y. Peng et al.. Generalized theory and application of Stokes parameter measurements made with a single photoelastic modulator [J]. Appl. Phys., 2006, 100(6): 063537

[16] [16] R. Kress. Numerical Analysis [M]. Berlin: Springer-Verlag, 1998

[17] [17] Li Fanyue, Han Jie, Zeng Aijun et al.. Method for measuring retardation by swinging quarter-wave plate with phase modulator [J]. Chinese J. Lasers, 2011, 38(2): 0208003

[18] [18] Yang Kun, Zeng Aijun, Wang Xiangzhao et al.. Fast axis calibration of quarter-wave plate by foundamental component extinction [J]. Chinese J. Lasers, 2007, 34(11): 1554～1556

[19] [19] Hu Jianming, Zeng Aijun, Wang Xiangzhao. Method to measure phase tetardation of wave plate based on photoelastic modulation [J]. Acta Optica Sinica, 2006, 26(11): 1681～1686

[20] [20] Wang Yonghui, Zheng Chunlong, Zhao Zhentang. Multi-point calibration method based on Stokes ellipsometry system [J]. Chinese J. Lasers, 2012, 39(11): 1108013

[21] [21] Li Zhicheng, Tang Zhilie, Chen Ping et al.. Study of photoelastic stress distribution and imaging method based on Stokes parameters [J]. Acta Optica Sinica, 2012, 32(5): 0512005

[22] [22] Hou Junfeng, Yu Jia, Wang Dongguang et al.. Phase retardation measurement of wave plates based on the self-calibration method [J]. Chinese J. Lasers, 2012, 39(4): 0408007

[23] [23] Cao Shaoqian, Bu Yang, Wang Xiangzhao et al.. Measurement technique for the Mueller matrix based on a single photo-elastic modulator [J]. Acta Optica Sinica, 2013, 33(1): 0112006

[24] [24] B. Wang, T. C. Oakberg. A new instrument for measuring both the magnitude and angle of low level linear birefringence [J]. Rev. Sci. Instrum., 1999, 70(10): 3847～3854