Method for Inspection of Phase Defects in Extreme Ultraviolet Lithography Mask

Wei Cheng; Sikun Li; Xiangzhao Wang

doi:10.3788/AOS221209

Acta Optica Sinica, Volume. 43, Issue 1, 0112001(2023)

Method for Inspection of Phase Defects in Extreme Ultraviolet Lithography Mask

Wei Cheng^1,2, Sikun Li^1,2、*, and Xiangzhao Wang^1,2、**

¹Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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Wei Cheng, Sikun Li, Xiangzhao Wang. Method for Inspection of Phase Defects in Extreme Ultraviolet Lithography Mask[J]. Acta Optica Sinica, 2023, 43(1): 0112001

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Paper Information

Category: Instrumentation, Measurement and Metrology

Received: May. 27, 2022

Accepted: Jun. 20, 2022

Published Online: Jan. 6, 2023

The Author Email: Li Sikun (lisikun@siom.ac.cn), Wang Xiangzhao (wxz26267@siom.ac.cn)

DOI:10.3788/AOS221209

Topics

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Instrumentation, Measurement and Metrology