Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Acta Optica Sinica, Volume. 33, Issue 6, 622002(2013)

Polarization Aberration Compensation Method for Lithographic Projection Lens Based on a Linear Model

Tu Yuanying1,2、* and Wang Xiangzhao1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
    • show less
    AbstractGet PDF(in Chinese)
    Figures&Tables (0)
    Equations (0)
    References (17)
    Cited By (5)
    Tools
    Paper Information
    Topics
    Cited By

    Article index updated: Mar. 10, 2025

    The article is cited by 5 article(s) CLP online library. (Some content might be in Chinese.)
    Tools

    Get Citation

    Copy Citation Text

    Tu Yuanying, Wang Xiangzhao. Polarization Aberration Compensation Method for Lithographic Projection Lens Based on a Linear Model[J]. Acta Optica Sinica, 2013, 33(6): 622002

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Category: Optical Design and Fabrication

    Received: Feb. 4, 2013

    Accepted: --

    Published Online: May. 15, 2013

    The Author Email: Yuanying Tu (tuyuanying@siom.ac.cn)

    DOI:10.3788/aos201333.0622002

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology