Acta Photonica Sinica, Volume. 54, Issue 5, 0531001(2025)

Fabrication of Filter with Wide Spectrum and Deep Cutoff for Ultraviolet Detection System

Jing ZHANG1, Yongkun WU1,2、*, Xiuhua FU1,2, Yonggang PAN2,3, Zhaowen LIN2,3, Fei YANG4, Zhuobin HUANG3, Guiqing WU3, and Ben WANG2,3
Author Affiliations
  • 1College of Optoelectronic Engineering,Changchun University of Science and Technology,Changchun 130022,China
  • 2Zhongshan Research Institute,Changchun University of Science and Technology,Zhongshan 528436,China
  • 3Zhongshan Jilian Optoelectronic Technology Co.,Ltd.,Zhongshan 528436,China
  • 4Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 130022,China
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    Figures & Tables(16)
    Deposition rate of Al film under different processes
    Optical constants of UV-SiO2 film
    ψ and Δ measurements and fitting curves of Si/ UV-SiO2/Al/UV-SiO2/Air samples
    Optical constants of Al films
    Optical constants of Al2O3 film and AlF3 film
    Spectral curve of double-sided design
    Design and test spectral curves of filter
    Influence of thickness of metal layers on spectra of filter
    Improvement in spectral performance after debugging
    Surface morphology and uniform equivalent absorption layer model
    Optical constants of uniform equivalent absorption layer
    Effect of surface roughness layer on spectra
    Spectral curves of double-sided coating
    Actual image of the sample
    • Table 1. Deposition parameters of Al film and UV-SiO2 film

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      Table 1. Deposition parameters of Al film and UV-SiO2 film

      MaterialSubstrate temperature/℃DepositionRate/(nm·s-1Deposition method

      EB Oxygenation/

      sccm

      Degree of vacuum/

      (×10-4 Pa)

      UV-SiO2250.6EB204
      Al251.0EB04
    • Table 2. Deposition parameters of Al2O3 film and AlF3 film

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      View in Article

      Table 2. Deposition parameters of Al2O3 film and AlF3 film

      MaterialSubstrate temperature/℃Deposition rate/(nm·s-1Deposition methodEB oxygenation/sccmDegree of vacuum/(×10-4 Pa)
      Al2O33000.3EB154
      AlF33000.5RH4
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    Jing ZHANG, Yongkun WU, Xiuhua FU, Yonggang PAN, Zhaowen LIN, Fei YANG, Zhuobin HUANG, Guiqing WU, Ben WANG. Fabrication of Filter with Wide Spectrum and Deep Cutoff for Ultraviolet Detection System[J]. Acta Photonica Sinica, 2025, 54(5): 0531001

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    Paper Information

    Category:

    Received: Oct. 30, 2024

    Accepted: Jan. 6, 2025

    Published Online: Jun. 18, 2025

    The Author Email: Yongkun WU (wuyongkun0202@163.com)

    DOI:10.3788/gzxb20255405.0531001

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