Process Optimization of CCD UV-Responsive Sensitivity Enhancement by Spin-Coating

FENG Yu-xiang; MENG Yin-xia; ZHANG Guo-yu; WU Yi-hui; HAO Peng

doi:10.3964/j.issn.1000-0593(2017)09-2826-06

Spectroscopy and Spectral Analysis, Volume. 37, Issue 9, 2826(2017)

Process Optimization of CCD UV-Responsive Sensitivity Enhancement by Spin-Coating

FENG Yu-xiang^1,2、*, MENG Yin-xia², ZHANG Guo-yu², WU Yi-hui¹, and HAO Peng¹

Author Affiliations

¹[in Chinese]

²[in Chinese]

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References(3)

[4] [4] Zheng Gong, Brandon K Chen, Jun Liu, et al. Light: Science & Applications, 2014, 10.1038/lsa.2014.105.

[5] [5] Michael A Damento, Andrew A Barcellos, William V Schempp. SPIE, 2011, 2415: 204.

[6] [6] Lin Chunche, Chen Weiting, et al. Light: Science & Applications, 2016, 10.1038/lsa.2016.66.

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FENG Yu-xiang, MENG Yin-xia, ZHANG Guo-yu, WU Yi-hui, HAO Peng. Process Optimization of CCD UV-Responsive Sensitivity Enhancement by Spin-Coating[J]. Spectroscopy and Spectral Analysis, 2017, 37(9): 2826

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Paper Information

Received: Jul. 19, 2016

Accepted: --

Published Online: Oct. 16, 2017

The Author Email: Yu-xiang FENG (1542871512@qq.com)

DOI:10.3964/j.issn.1000-0593(2017)09-2826-06

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology