[1] [1] Wang Hongyan, Yuan Shengfu, Zhang Peng et al.. choice of cavity′s parameters for a discharge driven infrared multi-band chemical laser[J]. Chinese J. Lasers, 2006, 32(8):1040～1044

[2] [2] Xu Xiaojun, Lu Qisheng, Yuan Shengfu et al.. Numerical simulation of ordered aero-optical aberrations in hydrogen fluorine chemical laser[J]. Chinese J. Lasers, 2002, A29(2):113～118

[3] [3] Yu Haijun, Tang Shukai, Wang Jian et al.. DC discharge for the all gas-phase iodine laser[J]. High Power Laser and Particle Beams, 2006, 18(5):746～748

[4] [4] D. L. Carroll, J. T. Verdeyen, D. M. King et al.. Contiouous wave laser oscillation on the 1315 nm transition of atomic iodine pumped by O2 produced in an electric discharge[J]. Appl. Phys. Lett., 2005,86:40～44

[5] [5] J. W. Cobum, M. Chen. Optical emission spectroscopy of reactive plasmas:A method for correlating emission intensities to reactive particle density[J]. J. Appl. Phys., 1980,51(6):3134～3136

[6] [6] V. M. Donnellv, D. L. Flamm, W. C. Dautremont et al.. Anisotropic etching of SiO2 in low-frequency CF4/O2 and NF3/Ar plasmas[J]. J. Appl. Phys.,1984,55(1): 242～252

[7] [7] R. d′Aeostino F. Cramarossa et al.. Spectroscopic diagnostics of CF4-O2 plasmas during Si and SiO2 etching processes[J].J. Appl. Phys., 1981, 52(3):1259～263

[8] [8] J. S. Jenq, J. Ding, J. W. Taylor et al.. Absolute fluorine atom concentrations in RIE and ECR CF4 plasmas measured by actinometry[J]. Plasma Sources Sci. Technol., 1994,3:154～161

[9] [9] A. Tserepi, W. Schwarzenbach, J. Derouard et al.. Kinetics of F atoms and fluorocarbon radicals studied by threshold ionization mass spectrometry in a microwave CF4 plasma[J]. J. Vac. Sci. Technol. A, 1997, 15(6):3120～3126

[10] [10] K. Sasaki, Y. Kawai, K. Kadota. Determination of fluorine atom density in reactive plasmas by vacuum ultraviolet absorption spectroscopy at 95.85 nm[J]. Rev. Sci. Instr., 1999, 70(1):76～81

[11] [11] Howard Schlossberg. Fluorine-atom probe techniques for chemical lasers[J]. J. Appl. Phys., 1976,47(5): 2044～2045

[12] [12] L. P. Duo, S. K. Tang, H. J. Yu et al.. DC discharge characteristics and fluorine atom yield in NF3/He[J].Chin. Opt. Lett.,2006, 4(3):170～172

[13] [13] G. C. Manke II, T. L. Henshaw, T. J. Madden. Characterizing fluorine and chlorine atom flow rates using Iodine atom spectrometry[J]. AIAA Journal, 2001,39(3)：447～454

[14] [14] Charles F. Wisniewski, Kevin B. Hewett, G. C. Manke et al.. Direct measurements of fluorine atom concentration, gain length and small signal gain in an hydrogen fluoride overtone laser[J], Chem.Phys. Lett., 2003, 370: 591～596

[15] [15] Wang Hongyan, Yuan Shengfu, Li Qiang et al.. A discharge driven continuous wave single line HD/HF chemical laser for atmospheric absorption measurement[J]. Chinese J. Lasers, 2008, 35(7):997～1000