OPTICS & OPTOELECTRONIC TECHNOLOGY, Volume. 19, Issue 2, 64(2021)

A Stress Birefringence Measurement Method Based on Photoelastic Modulator

ZHANG Wei1、*, YANG Lin2, and LIU Can3
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    References(1)

    [10] [10] Wong C F. Birefringence measurement using a photoelastic modulator[J]. Applied Optics, 1979, 18(23): 3996-3999.

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    ZHANG Wei, YANG Lin, LIU Can. A Stress Birefringence Measurement Method Based on Photoelastic Modulator[J]. OPTICS & OPTOELECTRONIC TECHNOLOGY, 2021, 19(2): 64

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    Paper Information

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    Received: Nov. 2, 2020

    Accepted: --

    Published Online: Aug. 23, 2021

    The Author Email: ZHANG Wei (1148073029@qq.com)

    DOI:

    CSTR:32186.14.

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