[1] [1] T. Feigl, S. Yulin, N. Benoit et al.. High-temperature LPP collector mirrors［C］. SPIE, 2006, 6151(4A): 1～9

[2] [2] W. H. Wang, H. Y. Bai, M. Zhang et al.. Interdiffusion in nanometer-scale multilayers investigated by in situ low-angle X-ray diffraction ［J］. Phys. Rev. B., 1999, 59(16): 10811～10822

[3] [3] P. Heitjans, S. Indris. Diffusion and ionic conduction in nanocrystalline ceramics ［J］. J. Phys. Condens. Matter., 2003, 15(30): R1257～R1289

[4] [4] S. C. Jeong, I. Katayama, H. Katayama et al.. Simulation study on the measurements of diffusion coefficients in solid materials by short-lived radiotracer beams ［J］. Jpn. J. Appl. Phys., 2003, 42(7A): 4576～4583

[5] [5] J. DuMond, J. P. Youtz. An X-ray method of determining rates of diffusion in the solid state ［J］. J. Appl. Phys., 1940, 11(5): 357～365

[6] [6] U. Gsele, K.N. Tu. Growth kinetics of planar binary diffusion couples: “thin-film case” versus “bulk cases” ［J］. J. Appl. Phys., 1982, 53(4): 3252～3260

[7] [7] R. S. Rosen, D. G. Stearns, D. S. P. Vernon et al.. Silicide layer growth-rates in Mo/Si multilayers ［J］. Appl. Opt., 1993, 32(34): 6975～6980

[8] [8] Wang Yonggang, Meng Yanli, Chen Bo et al.. Measurement of super-smooth surface by grazing X-ray scattering method ［J］. Optics and Precision Engineering, 2010, 18(1): 60～68

[9] [9] S. Bruijna, R. W. E. van de Kruijsa, A. E. Yakshin et al.. In-situ study of the diffusion-reaction mechanism in Mo/Si multilayered films ［J］. Appl. Surf. Sci., 2011, 257(4): 2707～2711