A 172 mJ, high-energy picosecond 355 nm ultraviolet laser system at 100 Hz

Jiatong Li; Jiayu Zhang; Tiejun Ma; Yongping Yao; Runze Liang; Xue Zhou; Chunyan Jia; Shengjun Huang; Hongkun Nie; Bo Yao; Jingliang He; Baitao Zhang

doi:10.1017/hpl.2024.52

High Power Laser Science and Engineering, Volume. 12, Issue 5, 05000e68(2024)

A 172 mJ, high-energy picosecond 355 nm ultraviolet laser system at 100 Hz

Jiatong Li1... Jiayu Zhang1, Tiejun Ma1, Yongping Yao1, Runze Liang1, Xue Zhou1, Chunyan Jia1, Shengjun Huang1, Hongkun Nie1,*, Bo Yao1, Jingliang He1,2, and Baitao Zhang12,* |Show fewer author(s)

Author Affiliations

¹Institute of Novel Semiconductors, State Key Laboratory of Crystal Materials, Shandong University, Jinan, China

²Key Laboratory of Laser & Infrared System, Ministry of Education, Shandong University, Qingdao, China

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Jiatong Li, Jiayu Zhang, Tiejun Ma, Yongping Yao, Runze Liang, Xue Zhou, Chunyan Jia, Shengjun Huang, Hongkun Nie, Bo Yao, Jingliang He, Baitao Zhang. A 172 mJ, high-energy picosecond 355 nm ultraviolet laser system at 100 Hz[J]. High Power Laser Science and Engineering, 2024, 12(5): 05000e68

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