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Laser & Optoelectronics Progress, Volume. 50, Issue 11, 112202(2013)

Effect of Material Inhomogeneity on the Image Quality of Optical Systems with Extremely Small Aberration

Yang Tianxing1、*, Huang Wei1, Shang Hongbo1, Xu Weicai1, and Zhao Feifei1,2
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    [1] [1] Xu Weicai. Optical Design and Imaging Performance Compensation for the Lithographic Lens[D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics Chinese Academy of Sciences, 2011. 15-35.

    [2] [2] Julie L Ladison, Joseph F Ellison, Douglas C Allan, et al.. Achieving low wavefront specifications for DUV lithography: impact of residual stress in HPFS fused silica[C]. SPIE, 2001, 4346: 1416-1423.

    [3] [3] Richard N Pfisterer. Design of an objective for night vision application using axial GRIN materials[C]. SPIE, 1995, 2537: 270-278.

    [4] [4] Harry J Levinson. Principles of Lithography (Third Edition)[M]. Bellingham: SPIE Press, 2010. 16-20.

    [5] [5] Xu Weicai, Huang Wei, Yang Wang. Magnification tolerancing and compensation for the lithographic projection lens[J]. Acta Optica Sinica, 2011, 31(11): 1122003.

    [6] [6] Anurag Sharma, D Vizia Kumar, A K Ghatak. Tracing rays through graded-index media: a new method[J]. Appl Opt, 1982, 21(6): 984-987.

    [7] [7] G Hunter, L Sutton. Measurement of homogeneity of optical materials[C]. OSA, 1990 Technical Digest, 1990. 11.

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    Yang Tianxing, Huang Wei, Shang Hongbo, Xu Weicai, Zhao Feifei. Effect of Material Inhomogeneity on the Image Quality of Optical Systems with Extremely Small Aberration[J]. Laser & Optoelectronics Progress, 2013, 50(11): 112202

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Jun. 18, 2013

    Accepted: --

    Published Online: Sep. 17, 2013

    The Author Email: Yang Tianxing (ytx123147@163.com)

    DOI:10.3788/lop50.112202

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology