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Acta Optica Sinica, Volume. 44, Issue 17, 1732007(2024)

Generation of Ultrafast Extreme Ultraviolet Light Source and its Applications in Semiconductor Detection (Invited)

Zhinan Zeng*
Author Affiliations
  • Zhangjiang Laboratory, Shanghai 200120, China
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    AbstractGet PDF(in Chinese)
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    Article index updated: Sep. 29, 2025

    The article is cited by 1 article(s) CLP online library. (Some content might be in Chinese.)
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    Zhinan Zeng. Generation of Ultrafast Extreme Ultraviolet Light Source and its Applications in Semiconductor Detection (Invited)[J]. Acta Optica Sinica, 2024, 44(17): 1732007

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    Paper Information

    Category: Ultrafast Optics

    Received: Jun. 2, 2024

    Accepted: Aug. 22, 2024

    Published Online: Sep. 12, 2024

    The Author Email: Zhinan Zeng (zhinan_zeng@mail.siom.ac.cn)

    DOI:10.3788/AOS241119

    CSTR:32393.14.AOS241119

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology