Opto-Electronic Engineering, Volume. 31, Issue 2, 11(2004)

Implementation Methods for Amplitude Division Maskless Laser Interference Photolithography

[in Chinese]1,2, [in Chinese]1, and [in Chinese]2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    References(6)

    [4] [4] Bozler C O,Harris C T,Rabe S,et al.Arrays of gated field-emitter cones having 0.32μm tip-to tip spacing[J].J.Vac.Sci.Technol,1994,B12(2):629-632.

    [5] [5] Spallas J P,Hawryluk A M,Kania D R.Field emitter array mask patterning using laser interference lithography[J].J.Vac.Sci.Technol,1995,B13(5):1973-1978.

    [6] [6] Switkes M,Bloomstein T M,Rothschild M.Interference Lithography at 157nm[J].SPIE,2000,4000:1590-1593.

    [7] [7] Cowan J J.Holographic honeycomb microlens[J].Optical Engineering,1985,24(5):796-802.

    [9] [9] MacLeod B D,Kelsey A F,Leclerc M A,et al.Fully Automated Interference Lithography[J].SPIE,2002,4688:910-921.

    [10] [10] Choksi N,Pickard D S,McCord M,et al.Maskless extreme ultraviolet lithography[J].J.Vac.Sci.Tech,1999,B17(6):3047-3051.

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    [in Chinese], [in Chinese], [in Chinese]. Implementation Methods for Amplitude Division Maskless Laser Interference Photolithography[J]. Opto-Electronic Engineering, 2004, 31(2): 11

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    Paper Information

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    Received: Nov. 12, 2003

    Accepted: --

    Published Online: Nov. 14, 2007

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