Laser & Optoelectronics Progress, Volume. 51, Issue 3, 30007(2014)

Progress and Study of Measurement of Surface Oxide Layer on Single Crystal Silicon Sphere

Liu Wende*, Chen Chi, Luo Zhiyong, Fan Qiming, and Liu Yulong
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  • [in Chinese]
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    CLP Journals

    [1] Liu Wende, Chen Chi, Fan Qiming, Chu Chu, Luo Zhiyong. Study of Instrument for Measuring Oxide Layer on Surface of Silicon Sphere Used for Avogadro Project[J]. Laser & Optoelectronics Progress, 2016, 53(3): 31202

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    Liu Wende, Chen Chi, Luo Zhiyong, Fan Qiming, Liu Yulong. Progress and Study of Measurement of Surface Oxide Layer on Single Crystal Silicon Sphere[J]. Laser & Optoelectronics Progress, 2014, 51(3): 30007

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    Paper Information

    Category: Reviews

    Received: Oct. 2, 2013

    Accepted: --

    Published Online: Mar. 3, 2014

    The Author Email: Liu Wende (wendeliu@nim.ac.cn)

    DOI:10.3788/lop51.030007

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