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Chinese Journal of Lasers, Volume. 38, Issue 4, 407001(2011)

Study on Pellicle Optimization and Polarization Aberration Induced by Pellicle in Hyper Numerical Aperture Lithography

Zhou Yuan1,2、*, Li Yanqiu3, and Liu Guangcan1,2
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    Article index updated: Mar. 10, 2025

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    Zhou Yuan, Li Yanqiu, Liu Guangcan. Study on Pellicle Optimization and Polarization Aberration Induced by Pellicle in Hyper Numerical Aperture Lithography[J]. Chinese Journal of Lasers, 2011, 38(4): 407001

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    Paper Information

    Category: materials and thin films

    Received: Aug. 26, 2010

    Accepted: --

    Published Online: Mar. 31, 2011

    The Author Email: Yuan Zhou (zhouyuan304@163.com)

    DOI:10.3788/cjl201138.0407001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology