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Frontiers of Optoelectronics, Volume. 14, Issue 2, 229(2021)

Nanoimprint lithography for high-throughput fabrication of metasurfaces

Dong Kyo OH1, Taejun LEE1, Byoungsu KO1, Trevon BADLOE1, Jong G. OK2、*, and Junsuk RHO1,3
Author Affiliations
  • 1Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
  • 2Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology (SEOULTECH), Seoul 01811, Republic of Korea
  • 3Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
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    Dong Kyo OH, Taejun LEE, Byoungsu KO, Trevon BADLOE, Jong G. OK, Junsuk RHO. Nanoimprint lithography for high-throughput fabrication of metasurfaces[J]. Frontiers of Optoelectronics, 2021, 14(2): 229

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    Paper Information

    Category: REVIEW ARTICLE

    Received: Nov. 11, 2020

    Accepted: Feb. 2, 2021

    Published Online: Dec. 1, 2021

    The Author Email: Jong G. OK (jgok@seoultech.ac.kr)

    DOI:10.1007/s12200-021-1121-8

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology