Chinese Optics Letters, Volume. 8, Issue s1, 59(2010)

Plasma ion-assisted deposition in UV filters

Xiaojun Yin1, Shuaifeng Zhao1, Shuguo Fei1, Peng Gao1, Ruisheng Wang1, Jing Ma2, Shu Song2, and Bangjun Liao2
Author Affiliations
  • 1Shenyang Academy of Instrumentation Science, Shenyang 110043, China
  • 2Shenyang HB Optical Technology Co., Ltd., Shenyang 110043, China
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    References(7)

    [1] [1] J. Wang, R. L. Maier, and H. Schreiber, Proc. SPIE 6286, 813 (2006).

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    [4] [4] D. E. Morton and T. R. Jensen, OSA Technical Digest Series (Optical Society of America, 2001) MB6 (2001).

    [5] [5] G. Ockenfuss, D. Friedrich, and R. Sargent “Growing Demand for UV Optical Filters Drives in Coating Technology”, http://www.jdsu.com/product-literature/(May 11, 2008).

    [6] [6] U. B. Schallenberg and S. Jakobs, Optical Interference Coatings (OIC) 2001 TuB6 (2001).

    [7] [7] J. Tang, P. Gu, X. Liu, and H. Li, Morden Optical Thin Film Technology (in Chinese) (Zhejiang University Press, Hangzhou, 2006).

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    Xiaojun Yin, Shuaifeng Zhao, Shuguo Fei, Peng Gao, Ruisheng Wang, Jing Ma, Shu Song, Bangjun Liao, "Plasma ion-assisted deposition in UV filters," Chin. Opt. Lett. 8, 59 (2010)

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    Paper Information

    Category: 3d holographic display

    Received: Dec. 4, 2009

    Accepted: --

    Published Online: May. 14, 2010

    The Author Email:

    DOI:10.3788/COL201008s1.0059

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