Plasma ion-assisted deposition (PIAD) process for ultraviolet (UV)-induced transmission and full dielectric thin-film filters in the 200–400 nm spectral region is described. The design and manufacturing method of the UV filters are introduced. The UV filters exhibit deep blocking (> optical density (OD)5–OD6), high transmittance, and stable environment durability. These UV filters pass 10 cycles in an aggravated temperature-humidity test, according to ISO9022-2 and MIL-STD-810F standards.