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Acta Optica Sinica, Volume. 39, Issue 6, 0634001(2019)

Effect of Focused Bombarding Electron Beam on Transmission Microfocus X-Ray Source

Geng Niu1,2, Junbiao Liu1,2、*, Weixia Zhao1, Li Han1,2, and Yutian Ma1,2
Author Affiliations
  • 1 Laboratory of Superconductors and New Materials, Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing 100190, China
  • 2 University of Chinese Academy of Sciences, Beijing 100049, China
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    AbstractGet PDF(in Chinese)
    Figures&Tables (8)
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    References (38)
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    Figures & Tables(8)
    Relative energy deposition as function of penetration depth of electron beam

    Fig. 1. Relative energy deposition as function of penetration depth of electron beam

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    Energy deposition (left) and interaction (right) between electron beam with energy of 90 keV and tungsten target. Plot in left panel is energy deposition of black box in right panel

    Fig. 2. Energy deposition (left) and interaction (right) between electron beam with energy of 90 keV and tungsten target. Plot in left panel is energy deposition of black box in right panel

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    Principle of X-ray imaging

    Fig. 3. Principle of X-ray imaging

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    Intensity of X-ray produced by electron beam with different energies

    Fig. 4. Intensity of X-ray produced by electron beam with different energies

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    Gaussian distribution of X-ray produced by 90 keV electron beam with energy loss of 20%-100%

    Fig. 5. Gaussian distribution of X-ray produced by 90 keV electron beam with energy loss of 20%-100%

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    Distribution of X-ray produced by electron beam with different energies

    Fig. 6. Distribution of X-ray produced by electron beam with different energies

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    Distribution of X-ray produced from different targets by 90 keV electron beam

    Fig. 7. Distribution of X-ray produced from different targets by 90 keV electron beam

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    • Table 1. Simulation conditions of interaction between electron beam and target

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      Table 1. Simulation conditions of interaction between electron beam and target

      ParameterCondition
      Acceleration voltage of electron beam /kV30, 60, 90, 120, 150
      Spot diameter of electron beam /μm5
      Incident direction of electron beamPerpendicular to target
      Material of targetTungsten, molybdenum, chromium
      Thickness of targetCorresponding thickness which can deposit different energy percentages of electron beam (20%, 40%, 60%, 80% and 100%)
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    Geng Niu, Junbiao Liu, Weixia Zhao, Li Han, Yutian Ma. Effect of Focused Bombarding Electron Beam on Transmission Microfocus X-Ray Source[J]. Acta Optica Sinica, 2019, 39(6): 0634001

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    Paper Information

    Category: X-Ray Optics

    Received: Jan. 15, 2019

    Accepted: Mar. 11, 2019

    Published Online: Jun. 17, 2019

    The Author Email: Liu Junbiao (liujb@mail.iee.ac.cn)

    DOI:10.3788/AOS201939.0634001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology