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Acta Optica Sinica, Volume. 44, Issue 6, 0622001(2024)

System Design of Space Solar Extreme Ultraviolet Three-Waveband Imaging Spectrometer

Ziwen Duan1, Yangguang Xing1、*, Jilong Peng2, Shuwu Dai3, Ying Wang3, Chenglin Zhu3, Lei Yan4, Yifan Huang1, Yue Liu1、**, and Lin Li1
Author Affiliations
  • 1School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China
  • 2Beijing Institute of Spacecraft Environment Engineering, Beijing 100094, China
  • 3Beijing Institute of Spacecraft System Engineering, Beijing 100094, China
  • 4Beijing Institute of Astronautical Systems Engineering, Beijing 100076, China
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    References (35)
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    Figures & Tables(14)
    Operating principle of solar EUV three-waveband imaging spectrometer

    Fig. 1. Operating principle of solar EUV three-waveband imaging spectrometer

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    Schematic of EVLS grating

    Fig. 2. Schematic of EVLS grating

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    Optical layout of solar EUV three-waveband imaging spectrometer

    Fig. 3. Optical layout of solar EUV three-waveband imaging spectrometer

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    Reflectance of Mo/Si periodic multilayer film with 15 nm thickness of B4C coating on top in EUV band. (a) 17-21 nm; (b) 35-110 nm

    Fig. 4. Reflectance of Mo/Si periodic multilayer film with 15 nm thickness of B4C coating on top in EUV band. (a) 17-21 nm; (b) 35-110 nm

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    EVLS grating. (a) Substrate surface sag map; (b) curve of ruling density distribution

    Fig. 5. EVLS grating. (a) Substrate surface sag map; (b) curve of ruling density distribution

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    Focusing imaging performance evaluation of solar EUV three-waveband imaging spectrometer on image plane. (a) Curves of RMS radius with wavelength in 17-21 nm band; (b) curves of RMS radius with wavelength in 70-80 nm band; (c) curves of RMS radius with wavelength in 95-105 nm band; (d) curves of RMS radius with off-axis field of view in 17-21 nm band; (e) curves of RMS radius with off-axis field of view in 70-80 nm band; (f) curves of RMS radius with off-axis field of view in 95-105 nm band

    Fig. 6. Focusing imaging performance evaluation of solar EUV three-waveband imaging spectrometer on image plane. (a) Curves of RMS radius with wavelength in 17-21 nm band; (b) curves of RMS radius with wavelength in 70-80 nm band; (c) curves of RMS radius with wavelength in 95-105 nm band; (d) curves of RMS radius with off-axis field of view in 17-21 nm band; (e) curves of RMS radius with off-axis field of view in 70-80 nm band; (f) curves of RMS radius with off-axis field of view in 95-105 nm band

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    MTFs of solar EUV three-waveband imaging spectrometer at different wavelengths. (a) λ=19 nm; (b) λ=75 nm; (c) λ=100 nm

    Fig. 7. MTFs of solar EUV three-waveband imaging spectrometer at different wavelengths. (a) λ=19 nm; (b) λ=75 nm; (c) λ=100 nm

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    Full-field astigmatic aberration distribution of solar EUV three-waveband imaging spectrometer at different wavelengths. (a) λ=19 nm; (b) λ=75 nm; (c) λ=100 nm

    Fig. 8. Full-field astigmatic aberration distribution of solar EUV three-waveband imaging spectrometer at different wavelengths. (a) λ=19 nm; (b) λ=75 nm; (c) λ=100 nm

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    Line spread function of solar EUV three-waveband imaging spectrometer at different wavelengths. (a) λ=19 nm; (b) λ=75 nm; (c) λ=100 nm

    Fig. 9. Line spread function of solar EUV three-waveband imaging spectrometer at different wavelengths. (a) λ=19 nm; (b) λ=75 nm; (c) λ=100 nm

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    Diffraction enclosed energy to evaluate system's spatial resolution. (a) λ=19 nm; (b) λ=75 nm; (c) λ=100 nm

    Fig. 10. Diffraction enclosed energy to evaluate system's spatial resolution. (a) λ=19 nm; (b) λ=75 nm; (c) λ=100 nm

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    Simulation of slit imaging based on Monte Carlo ray tracing method. (a) Slit images of different spectral lines; (b) normalized energy distribution along length direction of slit

    Fig. 11. Simulation of slit imaging based on Monte Carlo ray tracing method. (a) Slit images of different spectral lines; (b) normalized energy distribution along length direction of slit

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    • Table 1. Specifications for imaging spectrometer

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      Table 1. Specifications for imaging spectrometer

      Performance parameterDesign value
      Wavelength region /nmSW：17-21，LW：70-80 and 95-105
      Temperature coverage /K104-107
      Spectral resolution /nm≤ 0.006 @SW，≤ 0.01 @LW
      Spatial resolution /（″）≤1.0
      Slit length /（″）≥300
      Raster coverage /（″）300
      Pixel size /μm13.5 @SW，20 @LW
      Optical volume /（mm×mm×mm）≤1800×400×100

    • Table 2. Specifications and optical element parameters of solar EUV three-waveband imaging spectrometer

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      Table 2. Specifications and optical element parameters of solar EUV three-waveband imaging spectrometer

      Instrument system parameter design
      Spectral resolution @17-21 nm /nm0.0058
      Spectral resolution @70-80 nm /nm0.0077
      Spectral resolution @95-105 nm /nm0.0071
      Spatial resolution @SW /（″）0.40
      Spatial resolution @LW /（″）0.589
      Optical volume /（mm×mm×mm）1700×370×100
      Telescope design
      Entrance aperture /mm100
      RT /mm2926.811
      Conic-1
      Δ /mm75
      fT /mm1465.326
      Slit design
      Slit width /（″）0.4，0.6，1.2，2.4，5
      Slit length /（″）576
      Raster coverage /（″）±150
      EVLS grating design
      m+1
      d0 /μm0.5
      i /（°）0.899
      rA /mm236.595
      β4.78×
      a /mm715.821
      b /mm529.293
      c /mm529.590
      ψ2 /mm-24.244×10-2
      Ruling area /（mm×mm）21×21
      Groove density /（line·mm-1）2000+0.4338y
      Three independent detectors design
      Wavelength bandTilt angle /（°）
      17-21 nm10.942
      70-80 nm16.847
      95-105 nm19.580

    • Table 3. Key components tolerance analysis parameters of solar EUV three-waveband imaging spectrometer

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      Table 3. Key components tolerance analysis parameters of solar EUV three-waveband imaging spectrometer

      ComponentTolerance itemValue of tolerance
      Primary mirrorSurface irregularity（RMS）/nmλ/25（λ=632.8）
      Conic±0.008
      Radius of curvature /mm±2.0
      Element decenter /μm±30
      Element tilt /（″）±20
      EVLS gratingSurface irregularity（RMS）/nmλ/40（λ=632.8）
      Line density /（groove/mm）±1
      Radius of curvature /mm±0.26
      Element decenter /μm±20
      Element tilt /（°）±0.025
      SlitElement decenter /μm±20
      Element tilt /（°）±0.04
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    Ziwen Duan, Yangguang Xing, Jilong Peng, Shuwu Dai, Ying Wang, Chenglin Zhu, Lei Yan, Yifan Huang, Yue Liu, Lin Li. System Design of Space Solar Extreme Ultraviolet Three-Waveband Imaging Spectrometer[J]. Acta Optica Sinica, 2024, 44(6): 0622001

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    Paper Information

    Category: Optical Design and Fabrication

    Received: May. 15, 2023

    Accepted: Jun. 15, 2023

    Published Online: Mar. 15, 2024

    The Author Email: Xing Yangguang (xyg@bit.edu.cn), Liu Yue (liuyue@bit.edu.cn)

    DOI:10.3788/AOS230980

    CSTR:32393.14.AOS230980

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology