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Acta Optica Sinica, Volume. 44, Issue 7, 0723002(2024)

Method of Measuring Surface Error Peak to Valley of Micro Lens Based on Far-Field Light Distribution

Le Tang1,2,4, Liangping Xia1,4、*, Man Zhang1, Weiguo Zhang3, Hao Sun2、**, Chunyan Wang2, Suihu Dang1, and Chunlei Du1,4
Author Affiliations
  • 1Key Laboratory of Micro Nano Optoelectronic Devices and Intelligent Perception Systems, Yangtze Normal University, Chongqing 408100, China
  • 2School of Opto-Electronic Engineering, Changchun University of Science and Technology, Changchun 130022, Jilin , China
  • 3Research Center for Micro-Nano Manufacturing and System Integration, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 400714, China
  • 4Zhuhai Multiscale Optoelectronics Technology Co., Ltd, Zhuhai 519060, Guangdong , China
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    Figures&Tables (10)
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    References (16)
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    Figures & Tables(10)
    Girdle error and section profile. (a) Negative girdle wavefront aberration map; (b) positive girdle wavefront aberration map; (c) girdle error cross section profile

    Fig. 1. Girdle error and section profile. (a) Negative girdle wavefront aberration map; (b) positive girdle wavefront aberration map; (c) girdle error cross section profile

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    Optical path figure of geometric propagation of light

    Fig. 2. Optical path figure of geometric propagation of light

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    Girdle error ray tracing diagrams. (a) Negative girdle error ray tracing; (b) positive girdle error ray tracing

    Fig. 3. Girdle error ray tracing diagrams. (a) Negative girdle error ray tracing; (b) positive girdle error ray tracing

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    Distributions of light intensity of detection surface under different H

    Fig. 4. Distributions of light intensity of detection surface under different H

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    Interferometer measured surface error and section profiles. (a) H=-1.91 μm; (b) H=-453 nm; (c) H=53 nm; (d) H=560 nm; (e) H=1.63 μm

    Fig. 5. Interferometer measured surface error and section profiles. (a) H=-1.91 μm; (b) H=-453 nm; (c) H=53 nm; (d) H=560 nm; (e) H=1.63 μm

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    Energy intensity distributions of experimental light spot under different H

    Fig. 6. Energy intensity distributions of experimental light spot under different H

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    Variation of simulation value Esv1/sv2 with girdle error H after experiment and compensation

    Fig. 7. Variation of simulation value Esv1/sv2 with girdle error H after experiment and compensation

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    • Table 1. Table of microlens optical parameters

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      Table 1. Table of microlens optical parameters

      MaterialClear aperture /mmRadius /mmConicFocal Length /mm
      D263teco0.34.5-0.57718.464

    • Table 2. Ratio of light intensity in S1 region and S2 region calculated based on geometric tracking simulation results

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      Table 2. Ratio of light intensity in S1 region and S2 region calculated based on geometric tracking simulation results

      ES1/S20.02190.03140.04840.08000.10970.12140.13200.1336
      H-2 μm-1.5 μm-1 μm-500 nm-200 nm-100 nm-20 nm0
      ES1/S20.13520.14590.15900.19740.25260.29670.3335
      H20 nm100 nm200 nm500 nm1 μm1.5 μm2 μm

    • Table 3. Light intensity ratio of S1 region and S2 region calculated based on experimental results

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      Table 3. Light intensity ratio of S1 region and S2 region calculated based on experimental results

      H-1.91 μm-1.2 μm-580 nm-60 nm53 nm560 nm1.08 μm1.63 μm
      Esv1/sv20.06620.06940.07520.08610.09630.10030.10390.1045
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    Le Tang, Liangping Xia, Man Zhang, Weiguo Zhang, Hao Sun, Chunyan Wang, Suihu Dang, Chunlei Du. Method of Measuring Surface Error Peak to Valley of Micro Lens Based on Far-Field Light Distribution[J]. Acta Optica Sinica, 2024, 44(7): 0723002

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    Paper Information

    Category: Optical Devices

    Received: Dec. 4, 2023

    Accepted: Jan. 22, 2024

    Published Online: Apr. 11, 2024

    The Author Email: Xia Liangping (xialp@yznu.edu.cn), Sun Hao (sunh@cust.edu.cn)

    DOI:10.3788/AOS231883

    CSTR:32393.14.AOS231883

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology